Materials and MethodologyThe Fraunhofer Institute for Silicate Research ISC

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Inorganic-organic hybrid polymers can be structured directly in a lithographic process and function as positive or negative resist materials depending on their chemical formulation. To achieve even greater miniaturization of integrated circuits, the semiconductor industry is developing new (lithographic) structuring techniques, which in turn require suitable, novel resist materials. These materials must be capable of generating the necessary nanoscale structural features. This means they must be highly sensitive to the wavelengths employed and possess modifiable etching characteristics